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化学气相沉积与原子层沉积前体材料|Precursor materials of chemical vapor deposition and atomic layer deposition
化学气相沉积与原子层沉积前体材料
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4-[(2β,3α,5α,16β,17β)-3,17-Di(acetyloxy)-2-(4,4-dimethylpiperazinium-1-yl)androstan-16-yl]-1,2,3,4-tetrahydro-1,1-dimethyl-pyrazinium Dibromide
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(2-甲氧基乙基)(四氢呋喃-2-基甲基)胺
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3,3,4,4-四氟四氢呋喃
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3-bromo-2,2,4-trimethyl-7-nitro-2,3-dihydro-1-benzofuran
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5-chloro-2,3-dihydro-1-benzofuran-4-amine
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(1S)-1-(3-methyl-1-benzofuran-2-yl)ethan-1-ol
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1-[1-苯并呋喃-2-基-1-(吡啶-3-基)]甲胺二盐酸盐
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2-(4-methoxybenzoyl)-3-methyl-1-benzofuran-6-amine
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6-溴-2-苯基-(4H)-4-苯并吡喃
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Dibenzofuran-4-ylmethyl-isopropyl-aminehydrochloride
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3,5-Di-O-benzoyl-1,2-O-isopropylidene-alpha-D-ribofuranose min. 99%
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Dihydro Artemisinin Tetrahydrofuran Acetate
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1-(7-Bromobenzofuran-2-yl)ethanone
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4-AMINO-1-[2,3-O-(1-METHYLETHYLIDENE)PENTOFURANOSYL]-1,3,5-TRIAZIN-2(1H)-ONE
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3’-Hydroxy-3’-O-methoxymethyl Repaglinide Ethyl Ester (Mixture of Diastereomers)
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nitromethylbenzofuranone
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tert-Butyl 4-hydroxy-4-[2-(methoxycarbonyl)-1-benzofuran-5-yl]-1-piperidinecarboxylate
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2-(6-methoxy-7-methyl-1-benzofuran-3-yl)acetic Acid
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1,2-Di-O-acetyl-3-O-benzyl-4-C-mesylmethyl-5-O-mesyl-D-ribofuranose
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3-O-乙酰基-6-O-苯甲酰基-5-O-(甲磺酰基)-1,2-O-异亚丙基-α-D-呋喃葡萄糖
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5(6)-羧基萘荧光素,琥珀酰亚胺酯
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四氢呋喃氯化铬
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5-Amino-2-butylbenzofuran-3-yl (4-(3-(dibutyl-amino)propoxy)phenyl) oxalate
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Etofenamate Palmitate
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Clofenamide
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(5-cyanofuran-2-yl)methyl acetate
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3-Ethoxy-3-oxopropylzinc bromide 0.5 M in Tetrahydrofuran
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3-Heptylmagnesium bromide 0.25 M in Tetrahydrofuran
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3-methoxy-1-benzofuran-2-carbonitrile
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3,4-Furandimethanol
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6-CHLOROFURO[3,4-C]PYRIDIN-3(1H)-ONE
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(6)Helicene, racemic mixture of two enantiomers,neat,neat
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6-Chloro-3-methylbenzofuran
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5,7-Dimethoxyisoflavone
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5-Bromo-2-ethylbenzofuran
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4-(Phenylmethoxy)-1-β-D-ribofuranosyl-2(1H)-pyridinone
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2-(1-benzofuran-2-yl)acetonitrile
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2-Ethoxybenzylzinc chloride 0.5 M in Tetrahydrofuran
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3,4-Difluorophenylzinc bromide 0.5 M in Tetrahydrofuran
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(2R)-异丙基2-((((2R,3R,4R,5R)-5-(2,4-二氧代-3,4-二氢嘧啶-1(2H)- 基)-4-氟-3-羟基-4-甲基四氢呋喃-2-基)甲氧基)(苯氧基)磷酰基)氨基)丙酸乙酯
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