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化学气相沉积与原子层沉积前体材料|Precursor materials of chemical vapor deposition and atomic layer deposition
化学气相沉积与原子层沉积前体材料
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替诺福韦标准品
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5-[羟基(苯基)甲基]二氢呋喃-2(3H)-酮
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1,3:4,6-Di-O-benzylidene-2,5-dideoxy-2,5-imino-L-iditol (Mixture of Diastereomers)
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3-O-[(1,1-Dimethylethyl)dimethylsilyl]-1,2-O-(1-methylethylidene)-α-D-glucofuranose
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Ketoprofen Ethyl Ester
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Licofelone-d4
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4-[2-di-[2-(2,3-Dihydrobenzofuran-4-yl)ethyl]aminoethyl)-3,3-diphenylpyrolidine-2-one
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3-isocyanatofuran
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二（N，N'-二甲基哌嗪）四[铜（I），碘化]
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